A special Topical Symposium on Materials Modeling and Simulation will be organised as a part of the ICMCTF 2018 (International Conference on Metallurgical Coatings and This Films, http://www2.avs.org/conferences/ICMCTF/2018), which will be hold in San Diego, CA, USA,  April 23-27, 2018.

The Abstract submission deadline is on October 1, 2018 (http://www2.avs.org/conferences/ICMCTF/2018/abstracts.htm). 

Modeling and simulation of materials and related fabrication processes enable fundamental understanding as well as the prediction of behavior and properties of materials. By exploiting the power of modern computer systems, scale-bridging modeling and simulation approaches are realized. However, even the best simulation methods and tools are still limited with respect to their validity and accuracy. This is in fact known by the developers but often not appreciated by the users (both theorists and experimentalists) of the simulation tools. This topical symposium on "Materials Modeling and Simulation" is intended to provide a broad overview of the conceptually different and mutually complementing modeling and simulation approaches in materials sciences and their validity and limitations. The goal is to generate an idea of what is possible and what is not, demonstrated on practical examples from plasma physics, to thin film deposition to materials properties and performance.

The two invited speakers are distinguished researchers in their respective fields:

* Ralf Drautz, ICAMS, Ruhr University Bochum, Germany
  “From Density Functional Theory to High-temperature Materials”
* Mark J. Kushner, University of Michigan, USA
  “From Plasmas Toward Surfaces: How Plasma Simulation Supports Materials Science”

Symposium Chairs

Thomas Mussenbrock, BTU Cottbus, Germany

David Holec, Montanuniversität Leoben, Austria