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Registration closing soon: CECAM/Psi-k/HERALD Wo ... (No replies)

tonner
9 years ago
tonner 9 years ago

2nd Announcement - Registration closing soon

International Workshop

"Simulation of chemistry-driven growth phenomena for metastable materials"

Rauischholzhausen/Germany, November 8-11 2015

Organizers: Ralf Tonner, Simon Elliott, Karsten Reuter, Jörg Neugebauer

Location: Schloss Rauischholzhausen/Germany

When: November 08, 2015 to November 15, 2015

Funded by: CECAM, Psi-k/ESF, EU COST-action HERALD, GRK 1782 Marburg

Web-site: http://www.staff.uni-marburg.de/~simgrow

Deadline for registration: August, 15 2015

Deadline for submitting abstracts: August, 15 2015

Dear Colleagues and young researchers,

The controlled growth of thin films based on metastable materials by chemistry-driven processes is of high technological importance for topics like semiconductor devices or optical coatings. Computational modelling of this inherently multiscale process is crucial for an atomistic understanding and enables a decoupling and separate optimization of the growth-determining factors of non-equilibrium materials. This workshop will result in a joint effort by experts from different modelling communities covering the necessary length and time scales.

The workshop will take place in a beautiful castle one train-hour north of Frankfurt in an environment fostering intense discussions.

The main idea of the workshop is to bring together experts which work on the simulation of growth phenomena at the different scales and which due to the different employed methodology hitherto meet usually in separate conference and workshop formats. The central theme will be to introduce the state-of-the-art and current challenges in the individual fields, and to discuss ideas of bridging between them.

The workshop will be restricted to 40-50 participants for intense and informal discussions. Invited experts will cover the various key modelling areas, while a few eminent experimental colleagues present keynotes overviewing contemporary materials and processes, and defining the targets for the modelling.

The speaker list currently comprises:

Kerstin Volz (U Marburg, Germany)

Simon Elliott (Tyndall National Institute, Ireland)

Alexey Timoshkin (U St. Petersburg, Russia)

Stacey Bent (Stanford University, USA)

Peter Kratzer (U Duisburg-Essen, Germany)

Francesco Montalenti (U Milano, Italy)

Christian Carbogno (FHI Berlin, Germany)

Kristen Fichthorn (Penn State U, USA)

Chris Van de Walle (UC Santa Barbara, USA)

Talat Rahman (U Central Florida, USA)

Wolfram Miller (IKZ Berlin, Germany)

Ingo Steinbach (U Bochum, Germany)

Rochus Schmid (U Bochum, Germany)

Henrik Pedersen (U Linköping, Sweden)

Erwin Kessels (TU Eindhoven, Netherlands)

The speaker list including a continuously updated list of presentation titles is available at

http://www.staff.uni-marburg.de/~simgrow/speakers.html
Young researchers will have the opportunity to present their own research projects during a poster session.

Selected submissions will be upgraded to contributed talks.

Registration is still open:

http://www.staff.uni-marburg.de/~simgrow

With best regards,

Ralf Tonner

(Philipps-Universität Marburg, Germany, e-mail: [email protected]).




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Ab initio (from electronic structure) calculation of complex processes in materials